The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Aug. 18, 2015
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Ingo Saenger, Heidenheim, DE;
Christoph Hennerkes, Huettlingen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G21K 1/06 (2006.01); G21K 1/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70033 (2013.01); G03F 7/70075 (2013.01); G03F 7/70116 (2013.01); G03F 7/70191 (2013.01); G21K 1/065 (2013.01); G21K 1/067 (2013.01); G21K 1/12 (2013.01);
Abstract
An optical system has a light source having an original etendue of less than 0.1 mmfor an illumination system for projection lithography. An optical assembly serves for simultaneously increasing the etendue of a used emission of the light source. The optical assembly is embodied such that an increase in the etendue by at least a factor of 10 results. A component of the optical assembly that is impinged on is displaced relative to the light source such that an impingement region of the emission of the light source on the optical component of the optical assembly varies temporally.