The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Oct. 02, 2014
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Robin L. Tiner, Santa Cruz, CA (US);

Soo Young Choi, Fremont, CA (US);

Beom Soo Park, San Jose, CA (US);

Shinichi Kurita, San Jose, CA (US);

Bora Oh, Fremont, CA (US);

Gaku Furuta, Sunnyvale, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/68 (2006.01); C23C 16/458 (2006.01); H01L 21/67 (2006.01); H05B 3/22 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4586 (2013.01); H01L 21/67103 (2013.01); H05B 3/22 (2013.01);
Abstract

The present invention generally relates to a substrate support for use in a processing chamber. The substrate support is divided into quadrants with each quadrant capable of heating independent of the other quadrants. The independent heating permits the substrate support to provide different heating to either different substrate simultaneously disposed on the substrate support or to different areas of a common substrate. Thus, the substrate heating may be tailored to ensure desired processing of the substrate or substrates occurs.


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