The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Jul. 25, 2012
Applicants:
Shinya Yamanaka, Kyoto, JP;
Kazutoshi Takahashi, Kyoto, JP;
Michiyo Koyanagi, Kyoto, JP;
Mari Ohnuki, Kyoto, JP;
Inventors:
Shinya Yamanaka, Kyoto, JP;
Kazutoshi Takahashi, Kyoto, JP;
Michiyo Koyanagi, Kyoto, JP;
Mari Ohnuki, Kyoto, JP;
Assignee:
KYOTO UNIVERSITY, Kyoto-Shi, Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12Q 1/70 (2006.01); C12Q 1/68 (2006.01); G01N 33/50 (2006.01);
U.S. Cl.
CPC ...
C12Q 1/6888 (2013.01); C12Q 1/6881 (2013.01); G01N 33/5023 (2013.01); G01N 33/5073 (2013.01); C12Q 2600/158 (2013.01);
Abstract
The present invention provides a method for screening for iPS cells exhibiting differentiation resistance using a marker identified as lincRNA or mRNA that is specifically expressed in an iPS cell line exhibiting differentiation resistance, and such markers.