The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Apr. 10, 2015
Applicant:

Siliconware Precision Industries Co., Ltd., Taichung, TW;

Inventors:

Chih-Sheng Lin, Taichung, TW;

Chun-Lung Chen, Taichung, TW;

Hsin-Hung Lee, Taichung, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/02 (2006.01); H01L 23/00 (2006.01); H05K 1/11 (2006.01); H05K 3/40 (2006.01); C23C 14/34 (2006.01); C25D 7/12 (2006.01);
U.S. Cl.
CPC ...
H01L 24/11 (2013.01); C23C 14/34 (2013.01); C25D 5/02 (2013.01); C25D 7/12 (2013.01); H01L 24/06 (2013.01); H01L 24/14 (2013.01); H05K 1/111 (2013.01); H05K 3/4007 (2013.01); H01L 2224/03001 (2013.01); H01L 2224/0401 (2013.01); H01L 2224/11001 (2013.01); H01L 2924/01029 (2013.01); H05K 2201/0338 (2013.01); H05K 2201/0367 (2013.01); Y10T 29/49124 (2015.01);
Abstract

A connection structure for a substrate is provided. The substrate has a plurality of connection pads and an insulation protection layer with the connection pads being exposed therefrom. The connection structure includes a metallic layer formed on an exposed surface of each of the connection pads and extending to the insulation protection layer, and a plurality of conductive bumps disposed on the metallic layer and spaced apart from one another at a distance less than or equal to 80 μm, each of conductive bumps having a width less than a width of each of the connection pads. Since the metallic layer covers the exposed surfaces of the connection pads completely, a colloid material will not flow to a surface of the connection pads during a subsequent underfilling process of a flip-chip process. Therefore, the colloid material will not be peeled off from the connection pads.


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