The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2017
Filed:
Apr. 27, 2012
Shiro Tsukamoto, Ibaraki, JP;
Nobuhito Makino, Ibaraki, JP;
Atsushi Fukushima, Ibaraki, JP;
Kazuto Yagi, Ibaraki, JP;
Eiji Hino, Ibaraki, JP;
Shiro Tsukamoto, Ibaraki, JP;
Nobuhito Makino, Ibaraki, JP;
Atsushi Fukushima, Ibaraki, JP;
Kazuto Yagi, Ibaraki, JP;
Eiji Hino, Ibaraki, JP;
JX Nippon Mining & Metals Corporation, Tokyo, JP;
Abstract
A high-purity titanium target for sputtering containing 0.5 to 5 mass ppm of S as an additive component, wherein the purity of the target excluding additive components and gas components is 99.995 mass percent or higher. An object of this invention is to provide a high-quality titanium target for sputtering which is free from fractures and cracks during high-power sputtering (high-rate sputtering) and is capable of stabilizing the sputtering characteristics.