The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

May. 10, 2016
Applicant:

Gigaphoton Inc., Tochigi, JP;

Inventors:

Atsushi Ueda, Oyama, JP;

Takayuki Yabu, Oyama, JP;

Osamu Wakabayashi, Oyama, JP;

Georg Soumagne, Oyama, JP;

Takashi Saito, Oyama, JP;

Assignee:

Gigaphoton, Inc., Tochigi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/006 (2013.01); H05G 2/008 (2013.01);
Abstract

An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.


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