The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Oct. 01, 2015
Applicant:

National Chiao Tung University, Hsinchu, TW;

Inventors:

Zhen-Yu Li, Hsinchu, TW;

An-Jye Tzou, Hsinchu, TW;

Hao-Chung Kuo, Hsinchu, TW;

Chunyen Chang, Hsinchu, TW;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/778 (2006.01); H01L 29/207 (2006.01); H01L 29/10 (2006.01); H01L 29/20 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7786 (2013.01); H01L 21/0254 (2013.01); H01L 21/02381 (2013.01); H01L 21/02458 (2013.01); H01L 21/02507 (2013.01); H01L 21/02658 (2013.01); H01L 29/1075 (2013.01); H01L 29/2003 (2013.01); H01L 29/207 (2013.01);
Abstract

A high electron mobility transistor is provided, which includes a substrate, a superlattice structure formed on the substrate, and a transistor epitaxial structure formed on the superlattice structure such that the superlattice structure is interposed between the substrate and the transistor epitaxial layer. As the high electron mobility transistor has the carbon-doped AlN/GaN superlattice structure between the substrate and the transistor epitaxial layer. Thus, the present invention can effectively reduce vertical leakage current, so as to improve the epitaxial quality and the breakdown voltage of the high electron mobility transistor.


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