The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Aug. 03, 2012
Applicants:

Stan Johan Pieter Konings, Breda, NL;

Stephan Kujawa, Veldhoven, NL;

Petrus Hubertus Franciscus Trompenaars, Tilburg, NL;

Inventors:
Assignee:

FEI Company, Hillsboro, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/04 (2006.01); G01Q 30/12 (2010.01); H01J 37/20 (2006.01); H01J 37/26 (2006.01); B82Y 35/00 (2011.01);
U.S. Cl.
CPC ...
G01Q 30/12 (2013.01); B82Y 35/00 (2013.01); H01J 37/20 (2013.01); H01J 37/26 (2013.01); H01J 2237/2001 (2013.01); H01J 2237/2002 (2013.01); H01J 2237/2003 (2013.01); H01J 2237/28 (2013.01);
Abstract

A method and apparatus is provided for studying the reaction (chemical or physical) of a sample with a gas in the active atmosphere of an instrument such as an Environmental Transmission Electron Microscope (ETEM), optical microscope, X-ray microscope or scanning probe microscope. The sample is exposed to inert gas at a desired temperature before exchanging the inert gas to the active gas to reduce to avoid, or at least minimize, sample drift during image acquisition.


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