The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Dec. 31, 2015
Applicant:

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Feng Tang, Shanghai, CN;

Xiangzhao Wang, Shanghai, CN;

Peng Feng, Shanghai, CN;

Fudong Guo, Shanghai, CN;

Yunjun Lu, Shanghai, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01M 11/02 (2006.01); G01J 9/02 (2006.01);
U.S. Cl.
CPC ...
G01J 9/02 (2013.01);
Abstract

A device for measuring point diffraction interferometric wavefront aberration having an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. A method for detecting wavefront aberration of the optical system by using the device is also disclosed.


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