The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 23, 2017

Filed:

Mar. 16, 2015
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Tung-Lin Yang, Hsinchu, TW;

Chun-Hung Chang, Hsinchu County, TW;

Rouh Jier Wang, Hsinchu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F15D 1/00 (2006.01); F04D 25/00 (2006.01); F04D 29/00 (2006.01);
U.S. Cl.
CPC ...
F15D 1/00 (2013.01); F04D 25/00 (2013.01); F04D 29/00 (2013.01);
Abstract

Some embodiments of the present disclosure provide a method of dissipating process exhaust from a chamber. The method includes conveying the process exhaust from the chamber through an inner tube of a pipeline to abatement. The process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline. The method maintains an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline. The second temperature is negative offset from the first temperature within a predetermined value.


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