The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
May. 14, 2013
Mapper Lithography Ip B.v., Delft, NL;
Alexander Hendrik Vincent Van Veen, Rotterdam, NL;
Willem Henk Urbanus, Delft, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array () for forming a plurality of beamlets from the charged particle beam; and a beamlet projector () for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source () for generating a diverging charged particle beam; a collimator system () for refracting the diverging charged particle beam; and a cooling arrangement () for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.