The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Nov. 05, 2014
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Akira Ikegami, Tokyo, JP;
Hideto Dohi, Tokyo, JP;
Hideyuki Kazumi, Tokyo, JP;
Yoichi Ose, Tokyo, JP;
Naomasa Suzuki, Tokyo, JP;
Momoyo Enyama, Tokyo, JP;
Ryuji Nishi, Osaka, JP;
Akio Takaoka, Osaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.