The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
May. 26, 2016
Method and system for in-situ determination of a chemical composition of films during growth process
Neocera, Llc, Beltsville, MD (US);
Mikhail Strikovski, Gaithersburg, MD (US);
Jeonggoo Kim, Laurel, MD (US);
Solomon Kolagani, Ellicott City, MD (US);
Steven L. Garrahan, Odessa, FL (US);
Neocera, LLC, Beltsville, MD (US);
Abstract
System and method for determining the composition of deposited thin films by acquiring multiple sequential X-ray spectra for a film of interest during the deposition process as the film thickness increases, computing intensities of peaks found in the X-ray spectra corresponding to elements present in the film material, followed by computing, for each pair of elements, ratios of corresponding peak intensities, graphing the intensities and ratios against a parameter correlated to the film thickness, and applying a physically meaningful function to the graphed data for best fitting the data down to a ratio R(0) for each pair of the elements for a virtual film of zero thickness. Elemental concentrations ratio for each pair of elements is subsequently computed as a product of R(0) and a factor which is specific for the pair of elements, constant for the instrument as set up, and independent of elements concentrations, and of film thickness.