The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Apr. 30, 2014
Nantero Inc., Woburn, MA (US);
J. Thomas Kocab, Exeter, RI (US);
Thomas R. Bengtson, Derry, NH (US);
Sanjin Hosic, Somervile, MA (US);
Rahul Sen, Lesxington, MA (US);
Billy Smith, Woburn, MA (US);
David A. Roberts, Woburn, MA (US);
Peter Sites, Marblehead, MA (US);
Nantero Inc., Woburn, MA (US);
Abstract
The present disclosure provides methods for removing defects nanotube application solutions and providing low defect, highly uniform nanotube fabrics. In one aspect, a degassing process is performed on a suspension of nanotubes to remove air bubbles present in the solution. In another aspect, a continuous flow centrifugation (CFC) process is used to remove small scale defects from the solution. In another aspect, a depth filter is used to remove large scale defects from the solution. According to the present disclosure, these three methods can be used alone or combined to realize a low defect nanotube application solutions and fabrics.