The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2017

Filed:

Jul. 09, 2012
Applicant:

Takashi Matsumoto, Ibaraki, JP;

Inventor:

Takashi Matsumoto, Ibaraki, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 31/02 (2006.01); B01J 37/08 (2006.01); B82Y 40/00 (2011.01); B82Y 30/00 (2011.01); B01J 37/34 (2006.01); B01J 27/24 (2006.01); B01J 35/00 (2006.01);
U.S. Cl.
CPC ...
C01B 31/0233 (2013.01); B01J 27/24 (2013.01); B01J 35/002 (2013.01); B01J 37/08 (2013.01); B01J 37/349 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01B 2202/22 (2013.01);
Abstract

The pretreatment method for carbon nanotube formation according to the present invention comprises a first plasma treatment process in which catalytic metal fine particles are formed by applying plasma to a catalytic metal layer and atomizing the catalytic metal, and a second plasma treatment process in which the catalytic metal fine particles are activated by applying plasma of a gas mixture, in which a hydrogen-containing gas and a nitrogen gas are mixed, to the catalytic metal fine particles. A co-catalyst layer formed of nitride such as TiN and TaN is preferably disposed below the catalytic metal layer. The co-catalyst layer is nitrated by the plasma of the gas mixture including the hydrogen-containing gas and the nitrogen gas and the activation ratio of the catalytic metal fine particles is increased.


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