The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Feb. 06, 2013
Fuel system for lithographic apparatus, euv source, lithographic apparatus and fuel filtering method
Asml Netherlands B.v., Veldhoven, NL;
Wilbert Jan Mestrom, Roermond, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A fuel supply for an EUV radiation source is disclosed. The fuel supply comprises a reservoir () for retaining a volume of fuel (), a nozzle (), in fluid connection with the reservoir, and configured to direct a stream of fuel along a trajectory towards a plasma formation location, and a fuel contamination control arrangement () which separates contamination particles from the fuel. The contamination control arrangement comprises at least one acoustic filter. The acoustic filter may apply an acoustic standing wave to the fuel. Also disclosed is a method of controlling contamination in such a fuel supply.