The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Oct. 23, 2015
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Abstract
A layout structure, a semiconductor device and an electronic apparatus are provided. The layout structure includes at least one LDMOS. The LDMOS includes a source, a drain and a gate. The drain is strip-shaped, the source and gate are cyclic structures, the inner circumference of the source is less than the outer circumference of the gate but is greater than the inner circumference of the gate, the inner ring of the source overlaps with the gate in all directions, and the drain is located inside the inner ring of the gate. Because the source and gate are configured as cyclic structures and the inner ring of the source overlaps with the gate in every direction, the layout structure can increase the current and reduce the area of LDMOS devices. Semiconductor devices manufactured based on the layout structure and electronic apparatuses including the semiconductor devices also have the above-described advantages.