The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Dec. 09, 2015
Jang-gn Yun, Hwaseong-si, KR;
Joon Sung Lim, Yongin-si, KR;
Jae-ho Ahn, Seoul, KR;
Abstract
A semiconductor device includes a plurality of line patterns including at least two continuous line repetition units having, as one of the line repetition unit, four line patterns continuously arranged in a first direction and having variable widths based on location. To form the plurality of line patterns including the at least two continuous line repetition units, a plurality of reference patterns are formed repeatedly at a uniform reference pitch on a feature layer. A plurality of first spacers covering both side walls of each of the plurality of reference patterns are formed. A plurality of second spacers covering both side walls of each of the plurality of first spacers are formed by removing the plurality of reference patterns. The feature layer is etched using the plurality of second spacers as an etch mask by removing the plurality of first spacers.