The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Feb. 14, 2011
Applicants:

Jeroen Herman Lammers, Eindhoven, NL;

Sander Frederik Wuister, Eindhoven, NL;

Roelof Koole, Eindhoven, NL;

Inventors:

Jeroen Herman Lammers, Eindhoven, NL;

Sander Frederik Wuister, Eindhoven, NL;

Roelof Koole, Eindhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 33/00 (2006.01); B29C 59/02 (2006.01); G03F 7/00 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); Y10T 428/24802 (2015.01);
Abstract

An imprint lithography template is disclosed. The imprint lithography template includes a plurality of pattern features extending from a plane of a body of the imprint lithography template, and away from that body, the pattern features to be used to apply a pattern into an imprintable medium. The imprint lithography template further includes a plurality of assist features in the form of recesses extending from the plane of that body of the imprint lithography template, and into that body. A method for forming the assist features in the imprint lithography template, using self-assembled block copolymers as an etch resist, is also disclosed.


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