The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2017

Filed:

Jan. 24, 2013
Applicants:

Shinya Nishimura, Toyota, JP;

Narumasa Soejima, Seto, JP;

Kensaku Yamamoto, Okazaki, JP;

Inventors:

Shinya Nishimura, Toyota, JP;

Narumasa Soejima, Seto, JP;

Kensaku Yamamoto, Okazaki, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 21/311 (2006.01); H01L 21/306 (2006.01); H01L 21/225 (2006.01); H01L 21/31 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 21/265 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7834 (2013.01); H01L 21/225 (2013.01); H01L 21/2652 (2013.01); H01L 21/28238 (2013.01); H01L 21/30604 (2013.01); H01L 21/31 (2013.01); H01L 21/31116 (2013.01); H01L 29/0623 (2013.01); H01L 29/1095 (2013.01); H01L 29/4236 (2013.01); H01L 29/66621 (2013.01); H01L 29/66666 (2013.01); H01L 29/66734 (2013.01); H01L 29/7813 (2013.01); H01L 29/7841 (2013.01);
Abstract

A semiconductor device is provided with: a first conductivity type contact region; a second conductivity type body region; a first conductivity type drift region of; a trench formed through the contact region and body region from a front surface of the semiconductor substrate, wherein a bottom of the trench is positioned in the drift region; an insulating film covering an inner surface of the trench; a gate electrode accommodated in the trench in a state covered with the insulating film; and a second conductivity type floating region formed at a position deeper than the bottom of the trench, and adjacent to the bottom of the trench. The floating region includes a first layer adjacent to the bottom of the trench and a second layer formed at a position deeper than the first layer, wherein a width of the first layer is broader than a width of the second layer.


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