The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2017

Filed:

Apr. 16, 2015
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Wei-Hsiang Tseng, Hsinchu, TW;

Chao-Hsiung Wang, Hsin-chu, TW;

Chin-Hsiang Lin, Hsinchu, TW;

Heng-Hsin Liu, New Taipei, TW;

Ho-Ping Chen, Jhubei, TW;

Jui-Chun Peng, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); H01L 23/544 (2006.01); H01L 21/66 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
H01L 23/544 (2013.01); G03F 9/7011 (2013.01); G03F 9/7084 (2013.01); H01L 22/10 (2013.01); H01L 2223/5442 (2013.01); H01L 2223/54426 (2013.01); H01L 2223/54453 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A wafer alignment apparatus includes a light source, a light detection device, and a rotation device configured to rotate a first wafer and a second wafer. The light source is configured to provide a first light directed to the first wafer and a second light directed to the second wafer. The light detection device is configured to detect reflected light intensity from the first wafer to find a position of at least one wafer alignment mark of the first wafer and to detect reflected light intensity from the second wafer to find a position of at least one wafer alignment mark of the second wafer.


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