The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Jan. 04, 2016
Kabushiki Kaisha Toshiba, Minato-ku, JP;
Kazuhiro Ooshima, Kuwana, JP;
Takanori Matsumoto, Yokkaichi, JP;
KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;
Abstract
In one embodiment, a method of manufacturing a semiconductor device includes forming first patterns on a workpiece layer, and forming second patterns containing a first metal on side faces of the first patterns. The method further includes removing the first patterns after forming the second patterns, and forming third patterns on side faces of the second patterns by a chemical change of the first metal after removing the first patterns. The method further includes removing the second patterns after forming the third patterns, and processing the workpiece layer by using the third patterns as a mask after removing the second patterns.