The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Sep. 25, 2014
Applied Materials, Inc., Santa Clara, CA (US);
Chetan Mahadeswaraswamy, Sunnyvale, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Bryan Liao, Saratoga, CA (US);
Sergio Shoji, San Jose, CA (US);
Duy D. Nguyen, Milpitas, CA (US);
Hamid Noorbakhsh, Fremont, CA (US);
David Palagashvili, Mountain View, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and systems for controlling temperatures in plasma processing chamber for a wide range of setpoint temperatures and reduced energy consumption. Temperature control is coordinated between a coolant liquid loop and a heat source by a control algorithm implemented by the plasma processing module controller. The control algorithm may completely stop the flow of coolant liquid to a temperature-controlled component in response to a feedback signal indicating an actual temperature is below the setpoint temperature. The control algorithm may further be based at least in part on a feedforward control signal derived from a plasma power or change in plasma power input into the processing chamber during process recipe execution.