The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 02, 2017
Filed:
Dec. 04, 2013
Lam Research Corporation, Fremont, CA (US);
Damien Slevin, Salem, OR (US);
Brad Laird, Sherwood, OR (US);
Curtis Bailey, West Linn, OR (US);
Ming Li, West Linn, OR (US);
Sirish Reddy, Hillsboro, OR (US);
James Sims, Tigard, OR (US);
Mohamed Sabri, Beaverton, OR (US);
Saangrut Sangplug, Sherwood, OR (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A method for supplying vapor to a chamber includes providing a first diverter valve that, when open, diverts vapor away from the chamber, and a second diverter valve that, when open, supplies the vapor to the chamber; supplying a carrier gas to the chamber; after supplying the carrier gas, creating plasma in the chamber while a substrate is in the chamber; opening the first diverter valve and closing the second diverter valve; supplying the vapor by vaporizing at least one liquid precursor in a carrier gas; after a first predetermined period sufficient for the vapor to reach steady-state flow, closing the first diverter valve and opening the second diverter valve to supply the vapor to the chamber; and after a second predetermined period following the first predetermined period, opening the first diverter valve and closing the second diverter valve to stop supplying the vapor to the chamber.