The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2017

Filed:

Aug. 12, 2014
Applicants:

National University Corporation Hokkaido University, Sapporo-shi, Hokkaido, JP;

Japan Science and Technology Agency, Kawaguchi-shi, Saitama, JP;

Inventors:

Takashi Fukui, Sapporo, JP;

Katsuhiro Tomioka, Sapporo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 29/04 (2006.01); H01L 29/08 (2006.01); H01L 29/40 (2006.01); B82Y 10/00 (2011.01); H01L 29/41 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 29/66522 (2013.01); B82Y 10/00 (2013.01); H01L 21/0257 (2013.01); H01L 21/0262 (2013.01); H01L 21/02538 (2013.01); H01L 21/02603 (2013.01); H01L 29/045 (2013.01); H01L 29/0676 (2013.01); H01L 29/0847 (2013.01); H01L 29/401 (2013.01); H01L 29/413 (2013.01); H01L 29/66666 (2013.01); B82Y 40/00 (2013.01);
Abstract

A tunnel field-effect transistor (TFET) is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting p-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. Alternatively, the tunnel field-effect transistor is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting n-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. The nano wire is configured from a first region and a second region. For instance, the first region is intermittently doped with a p-type dopant, and the second region is doped with an n-type dopant.


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