The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2017

Filed:

Nov. 16, 2015
Applicant:

Stmicroelectronics, Inc., Coppell, TX (US);

Inventors:

Walter Kleemeier, Saratoga Springs, NY (US);

Qing Liu, Irvine, CA (US);

Assignee:

STMicroelectronics, Inc., Coppell, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/38 (2006.01); H01L 21/22 (2006.01); H01L 21/8238 (2006.01); H01L 29/45 (2006.01); H01L 27/092 (2006.01); H01L 27/12 (2006.01); H01L 21/02 (2006.01); H01L 21/84 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/778 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823814 (2013.01); H01L 21/02529 (2013.01); H01L 21/02532 (2013.01); H01L 21/02584 (2013.01); H01L 21/823871 (2013.01); H01L 21/84 (2013.01); H01L 27/092 (2013.01); H01L 27/1203 (2013.01); H01L 29/45 (2013.01); H01L 29/665 (2013.01); H01L 29/7838 (2013.01); H01L 21/8238 (2013.01); H01L 21/823821 (2013.01); H01L 27/0924 (2013.01); H01L 27/1211 (2013.01); H01L 29/778 (2013.01); H01L 29/7789 (2013.01);
Abstract

An integrated circuit includes a substrate supporting a transistor having a source region and a drain region. A high dopant concentration delta-doped layer is present on the source region and drain region of the transistor. A set of contacts extend through a pre-metal dielectric layer covering the transistor. A silicide region is provided at a bottom of the set of contacts. The silicide region is formed by a salicidation reaction between a metal present at the bottom of the contact and the high dopant concentration delta-doped layer on the source region and drain region of the transistor.


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