The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2017

Filed:

Aug. 28, 2015
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Murat Bozkurt, Veldhoven, NL;

Martin Jacobus Johan Jak, 's-Hertogenbosch, NL;

Patricius Aloysius Jacobus Tinnemans, Hapert, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/62 (2006.01); G06T 7/00 (2017.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G03F 7/705 (2013.01); G03F 7/70633 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/20224 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining () a plurality of candidate regions of interest, each candidate region of interest comprising a plurality of pixels in the image; (c) defining () an optimization metric value for the candidate regions of interest based at least partly on signal values of pixels within the region of interest; (d) defining () a target signal function which defines a contribution of each pixel in the image to a target signal value. The contribution of each pixel depends on (i) which candidate regions of interest contain that pixel and (ii) optimization metric values of those candidate regions of interest.


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