The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Aug. 22, 2014
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Ingo Saenger, Heidenheim, DE;
Frank Schlesener, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/72 (2006.01); G03F 7/20 (2006.01); G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2006 (2013.01); G02B 5/3083 (2013.01); G03F 7/20 (2013.01); G03F 7/70116 (2013.01); G03F 7/70191 (2013.01); G03F 7/70425 (2013.01); G03F 7/70566 (2013.01);
Abstract
The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising (a) a plurality of channels, each channel guiding a partial beam and at least one channel comprising at least one defect, and (b) at least one optical element arranged within the at least one channel having the at least one defect, the optical element being adapted to at least partially compensate the at least one defect of the partial beam of the channel.