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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9632410 B1

PDFFull Text
Date of Patent:
Apr. 25, 2017

Filed:

Sep. 29, 2015

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Shuhei Yamaguchi, Shizuoka, JP;

Toru Tsuchihashi, Shizuoka, JP;

Tomotaka Tsuchimura, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Jianq Chyun IP Office

Primary Examiner:

Cynthia Hamilton

Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 1/50 (2012.01); G03F 1/76 (2012.01); G03F 7/32 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); G03F 1/50 (2013.01); G03F 1/76 (2013.01); G03F 7/0045 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/2004 (2013.01); G03F 7/2039 (2013.01); G03F 7/2059 (2013.01); G03F 7/32 (2013.01);
Abstract

There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by a specific formula (1), and an ionic compound (B) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.

Find Patent Forward Citations

Yamaguchi, Shuhei. (2017). Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device (U.S. Patent No. 9632410). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9632410

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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