The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Feb. 04, 2014
Applicant:
Lintec Corporation, Itabashi-Ku, Tokyo, JP;
Inventors:
Kentaro Kusama, Tokyo, JP;
Baku Katagiri, Tokyo, JP;
Tomoo Orui, Tokyo, JP;
Satoru Shoshi, Tokyo, JP;
Assignee:
LINTEC Corporation, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/02 (2006.01); C08F 283/00 (2006.01); C08F 290/14 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0236 (2013.01); C08F 283/006 (2013.01); C08F 290/147 (2013.01); G02B 5/0257 (2013.01); G02B 5/0268 (2013.01); G02B 5/0278 (2013.01); C08J 2367/02 (2013.01); C08J 2433/06 (2013.01); C08J 2475/16 (2013.01); G02B 2207/123 (2013.01);
Abstract
A composition for light diffusion film in which the angle of aperture of diffused light in a light diffusion film obtainable therefrom can be expanded effectively, and a light diffusion film obtainable by the composition for light diffusion film are provided.