The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2017

Filed:

Feb. 19, 2015
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Hironori Ogawa, Tokyo, JP;

Masaki Mizuochi, Tokyo, JP;

Shuichi Nakagawa, Tokyo, JP;

Tsukasa Sugawara, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); G01B 9/02 (2006.01); G01N 23/22 (2006.01); G01B 15/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G01B 9/02021 (2013.01); G01B 9/02027 (2013.01); G01N 23/2204 (2013.01); G01B 15/00 (2013.01); H01J 2237/20292 (2013.01); H01J 2237/2817 (2013.01);
Abstract

To attain the above object, in the present invention, proposed are a stage apparatus including a sample stage that mounts a sample, a first position detection device that detects a position of the sample stage, a second position detection device that detects a position of the sample stage when the sample stage is positioned in a part of a stage movement range that the first position detection device is capable of detecting, and a control device that adjusts an offset amount of the first position detection device on the basis of a position detection result obtained by the second position detection device, and a charged particle beam apparatus using the stage apparatus.


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