The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Sep. 11, 2012
Applicants:
David Bessems, Eindhoven, NL;
Cornelius Maria Rops, Waalre, NL;
Inventors:
David Bessems, Eindhoven, NL;
Cornelius Maria Rops, Waalre, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); Y10T 137/8593 (2015.04);
Abstract
A fluid handling structure for a lithographic apparatus has, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure, a gas supply opening radially outward of the space, a fluid recovery opening radially outward of the gas supply opening, and a damper surface extending at least 0.5 mm radially outwards from the fluid recovery opening along the undersurface of the fluid handling structure.