The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Jul. 16, 2013
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Tomotaka Tsuchimura, Shizuoka, JP;
Tadateru Yatsuo, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C08F 257/00 (2006.01); G03F 1/20 (2012.01); G03F 7/038 (2006.01); C08F 12/24 (2006.01); C08F 212/14 (2006.01); C09D 125/18 (2006.01); C08K 5/19 (2006.01); G03F 1/22 (2012.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01); G03F 1/56 (2012.01); G03F 1/76 (2012.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); C08F 12/24 (2013.01); C08F 212/14 (2013.01); C08F 257/00 (2013.01); C08K 5/19 (2013.01); C09D 125/18 (2013.01); G03F 1/20 (2013.01); G03F 1/22 (2013.01); G03F 1/56 (2013.01); G03F 1/76 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/2037 (2013.01); G03F 7/2039 (2013.01);
Abstract
A chemical amplification resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by a group having a non-acid-decomposable polycyclic alicyclic hydrocarbon structure; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.