The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2017
Filed:
Mar. 13, 2012
Daimian Wang, Fremont, CA (US);
Daniel Wack, Fredericksburg, VA (US);
Damon F. Kvamme, Los Gatos, CA (US);
Tao-yi Fu, Fremont, CA (US);
Daimian Wang, Fremont, CA (US);
Daniel Wack, Fredericksburg, VA (US);
Damon F. Kvamme, Los Gatos, CA (US);
Tao-Yi Fu, Fremont, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
Methods and systems for source multiplexing illumination for mask inspection are disclosed. Such illumination systems enable EUV sources of small brightness to be used for EUV mask defect inspection at nodes below the 22 nm. Utilizing the multiple plane or conic mirrors that are either attached to a continuously rotating base with different angles or individually rotating to position for each pulse, the reflected beams may be directed through a common optical path. The light may then be focused by a condenser to an EUV mask. The reflected and scattered light from the mask may then be imaged by some imaging optics onto some sensors. The mask image may be subsequently processed for defect information.