The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2017

Filed:

Sep. 30, 2015
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventor:

Qibiao Chen, Fremont, CA (US);

Assignee:

KLA-Tencor Corp., Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G02B 27/09 (2006.01); G01N 21/47 (2006.01); G01N 21/95 (2006.01); G02B 13/14 (2006.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
G02B 27/0927 (2013.01); G01N 21/4738 (2013.01); G01N 21/8806 (2013.01); G01N 21/9501 (2013.01); G02B 13/143 (2013.01); G02B 27/0961 (2013.01); G01N 2021/8822 (2013.01); G01N 2201/0631 (2013.01); G01N 2201/0638 (2013.01);
Abstract

Systems configured to provide illumination for wafer inspection performed by a wafer inspection tool are provided. One system includes one or more pupil lenses configured to focus a first far field pattern having a shape different than a shape of light generated by a light source. The system also includes a field lens array positioned between the one or more pupil lenses and an aperture stop. In addition, the system includes a lens group configured to focus a second far field pattern generated by the field lens array to a back focal plane of the lens group. The back focal plane of the lens group is a field plane of a wafer inspection tool at which a wafer to be inspected is placed during wafer inspection.


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