The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2017

Filed:

Dec. 03, 2014
Applicant:

Ecole Polytechnique Fédérale DE Lausanne (Epfl), Lausanne, CH;

Inventors:

Loïc Arnaud Baboulaz, Lausanne, CH;

Gaël Georges Soudan, Morges, CH;

Martin Vetterli, Grandvaux, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 17/00 (2006.01); G01J 1/02 (2006.01); G01N 21/55 (2014.01);
U.S. Cl.
CPC ...
G01J 1/0271 (2013.01); G01N 21/55 (2013.01);
Abstract

A device for determining a bidirectional reflectance distribution function of a subject, including a light source for producing an incident light that is directed onto a subject at a predetermined zenith angle and at a predetermined azimuth angle, an element for displacing the light source at any location on the periphery of a hemispherical area centered on the subject, an element for measuring the bidirectional reflectance distribution function of the subject from one fixed location that is preferably aligned with a normal direction defined by the subject, a control unit adapted to control the element for displacing and/or the element for measuring. The element for displacing includes an arc-shaped arm at one end fixedly connected to the light source and slideably connected to a first support to adjust the zenith angle, and an element for pivoting the first support about the normal direction to permit adjustment of the azimuth angle.


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