The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 2017

Filed:

Jul. 25, 2011
Applicants:

Toyoji Shinohara, Tokyo, JP;

Kohtaro Kawamura, Tokyo, JP;

Toshiharu Nakazawa, Tokyo, JP;

Inventors:

Toyoji Shinohara, Tokyo, JP;

Kohtaro Kawamura, Tokyo, JP;

Toshiharu Nakazawa, Tokyo, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F24F 7/00 (2006.01); F04B 37/16 (2006.01); B01D 53/46 (2006.01); F04B 49/10 (2006.01); H01L 21/205 (2006.01); F04B 51/00 (2006.01); G01M 13/00 (2006.01); B01D 53/00 (2006.01); F04B 37/14 (2006.01); F04B 49/06 (2006.01); B01D 53/78 (2006.01);
U.S. Cl.
CPC ...
F24F 7/00 (2013.01); B01D 53/005 (2013.01); F04B 37/14 (2013.01); F04B 49/06 (2013.01); B01D 53/78 (2013.01); B01D 2258/0216 (2013.01); F04B 2201/1201 (2013.01);
Abstract

An exhaust system () is used for evacuating a chamber of a manufacturing apparatus () for manufacturing semiconductor devices, liquid crystal panels, LEDs, or solar cells. The exhaust system () includes a vacuum pump apparatus () for evacuating the chamber, an exhaust gas treatment apparatus () for treating an exhaust gas discharged from the chamber, and a controller () for controlling the vacuum pump apparatus () and/or the exhaust gas treatment apparatus (). Information of operation process of the manufacturing apparatus (), and the kind of gas and the flow rate of the gas supplied to the manufacturing apparatus () is inputted into the controller () to control the vacuum pump apparatus () and/or the exhaust gas treatment apparatus ().


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