The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Sep. 14, 2015
Applicant:

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

Krishna Balantrapu, Arlington, MA (US);

Brian D. Amos, Worcester, MA (US);

Stephen McCammon, Nashua, NH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/12 (2006.01); H05K 3/00 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/42 (2006.01); G03F 7/32 (2006.01); G03F 7/035 (2006.01); G03F 7/038 (2006.01); G03F 7/11 (2006.01); H05K 3/28 (2006.01); H05K 3/34 (2006.01);
U.S. Cl.
CPC ...
H05K 3/0079 (2013.01); G03F 7/035 (2013.01); G03F 7/038 (2013.01); G03F 7/09 (2013.01); G03F 7/091 (2013.01); G03F 7/11 (2013.01); G03F 7/20 (2013.01); G03F 7/2018 (2013.01); G03F 7/322 (2013.01); G03F 7/425 (2013.01); H05K 3/0076 (2013.01); H05K 3/28 (2013.01); H05K 3/0082 (2013.01); H05K 3/3452 (2013.01); H05K 2203/013 (2013.01); H05K 2203/0551 (2013.01); H05K 2203/0585 (2013.01);
Abstract

Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline strippable UV blocking composition is selectively applied to the surface of the UV transparent film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate.


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