The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Dec. 05, 2014
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Inventors:
Toshiro Morita, Kawasaki, JP;
Takashi Kamizono, Kawasaki, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 21/22 (2006.01); H01L 21/225 (2006.01); H01L 31/068 (2012.01); H01L 51/00 (2006.01); H01L 51/44 (2006.01); H01L 51/52 (2006.01); H01L 21/228 (2006.01);
U.S. Cl.
CPC ...
H01L 31/186 (2013.01); H01L 21/228 (2013.01); H01L 21/2225 (2013.01); H01L 21/2254 (2013.01); H01L 31/0682 (2013.01); H01L 31/1804 (2013.01); H01L 51/0096 (2013.01); H01L 51/448 (2013.01); H01L 51/5253 (2013.01); Y02E 10/547 (2013.01); Y02E 10/549 (2013.01); Y02P 70/521 (2015.11);
Abstract
A diffusing agent composition including a condensation product and an impurity diffusion component. The condensation product is a reaction product resulting from hydrolysis of an alkoxysilane. The impurity diffusion component is a monoester or diester of phosphoric acid, or a mixture thereof.