The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Feb. 03, 2016
Applicant:

Freescale Semiconductor, Inc., Austin, TX (US);

Inventors:

Anirban Roy, Austin, TX (US);

Ko-Min Chang, Austin, TX (US);

Assignee:

NXP USA, INC., Austin, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 29/792 (2006.01); H01L 27/11521 (2017.01); H01L 29/423 (2006.01); H01L 27/1157 (2017.01); H01L 21/28 (2006.01); H01L 29/66 (2006.01); H01L 27/11568 (2017.01);
U.S. Cl.
CPC ...
H01L 29/42348 (2013.01); H01L 21/28282 (2013.01); H01L 27/1157 (2013.01); H01L 27/11521 (2013.01); H01L 27/11568 (2013.01); H01L 29/42328 (2013.01); H01L 29/42332 (2013.01); H01L 29/42344 (2013.01); H01L 29/66825 (2013.01); H01L 29/66833 (2013.01); H01L 29/788 (2013.01); H01L 29/7881 (2013.01); H01L 29/792 (2013.01);
Abstract

A memory device has first and second memory cells in and over a substrate. A first doped region is in a first active region. A top surface of the first active region is substantially coplanar with a top surface of the first doped region. A control gate is over the first doped region and extends over a first side of the first doped region and over a second side of the first doped region. A charge storage layer is between the first control gate and the first active region including between the first select gate and the first doped region. A first select gate is over the first active region on the first side of the first doped region and adjacent to the control gate. A second select gate is over the first active region on the second side of the first doped region and adjacent to the control gate.


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