The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Aug. 24, 2015
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Marek Un{hacek over (c)}ovský, Brno, CZ;
Pavel Stejskal, Brno, CZ;
Tomá{hacek over (s)} Vystav{hacek over (e)}l, Brno, CZ;
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); G01N 23/203 (2006.01); H01J 37/244 (2006.01); H01J 37/252 (2006.01);
U.S. Cl.
CPC ...
G01N 23/203 (2013.01); H01J 37/244 (2013.01); H01J 37/252 (2013.01); H01J 2237/2442 (2013.01); H01J 2237/2446 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/24485 (2013.01); H01J 2237/24495 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/2555 (2013.01); H01J 2237/31745 (2013.01);
Abstract
The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: