The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Aug. 27, 2015
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Shuji Hirano, Shizuoka, JP;
Hiroo Takizawa, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/11 (2006.01); C08F 12/24 (2006.01); C08F 20/30 (2006.01); C08F 20/58 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2059 (2013.01); C08F 12/24 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/0758 (2013.01); G03F 7/11 (2013.01); G03F 7/2004 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); C08F 20/30 (2013.01); C08F 20/58 (2013.01);
Abstract
According to one aspect of the present invention, there is provided a pattern forming method comprising, in this order:
Hirano, Shuji. (2017). Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device (U.S. Patent No. 9612535). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9612535
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile