The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Oct. 03, 2016
Applicant:
Kenneth C. Johnson, Santa Clara, CA (US);
Inventor:
Kenneth C. Johnson, Santa Clara, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/00 (2006.01); G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03B 27/72 (2006.01); G02B 5/18 (2006.01); H05G 2/00 (2006.01); G02B 19/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1838 (2013.01); G02B 19/0095 (2013.01); G03F 7/70033 (2013.01); G03F 7/70158 (2013.01); G03F 7/70175 (2013.01); H05G 2/008 (2013.01);
Abstract
A plasma-generated EUV light source uses an EUV-diffracting collection mirror to channel spectrally pure in-band radiation through an intermediate-focus aperture and through EUV illumination optics. Out-of-band radiation is either undiffracted by the collection mirror or is diffractively scattered away from the aperture. The undiffracted portion, plus plasma-emitted radiation that does not intercept the collection mirror, can be efficiently recycled back to the plasma via retroreflecting mirrors, cat's-eye reflectors, or corner-cube reflectors, to enhance generation of in-band EUV radiation by the plasma.