The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2017

Filed:

Feb. 27, 2014
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Tsung-Hsiung Lee, Taoyuan, TW;

Shin-Cheng Lin, Tainan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/40 (2006.01); H01L 29/10 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/08 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7835 (2013.01); H01L 29/0653 (2013.01); H01L 29/1045 (2013.01); H01L 29/1087 (2013.01); H01L 29/402 (2013.01); H01L 29/407 (2013.01); H01L 29/66659 (2013.01); H01L 29/063 (2013.01); H01L 29/0847 (2013.01); H01L 29/42368 (2013.01);
Abstract

A semiconductor device is provided. The device may include a semiconductor layer; and a doped well disposed in the semiconductor layer and having a first conductivity type. The device may also include a drain region, a source region, and a body region, where the source and body regions may operate in different voltages. Further, the device may include a first doped region having a second conductivity type, the first doped region disposed between the source region and the doped well; and a second doped region having the first conductivity type and disposed under the source region. The device may include a third doped region having the second conductivity type and disposed in the doped well; and a fourth doped region disposed above the third doped region, the fourth doped region having the first conductivity type. Additionally, the device may include a gate and a field plate.


Find Patent Forward Citations

Lee, Tsung-Hsiung. (2017). Method and apparatus for mos device with doped region (U.S. Patent No. 9608107). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9608107

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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