The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2017

Filed:

Mar. 14, 2014
Applicant:

Shibaura Mechatronics Corporation, Yokohama-shi, Kanagawa, JP;

Inventors:

Konosuke Hayashi, Yokohama, JP;

Masaaki Furuya, Yokohama, JP;

Takashi Ootagaki, Yokohama, JP;

Yuji Nagashima, Yokohama, JP;

Atsushi Kinase, Yokohama, JP;

Masahiro Abe, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/6776 (2013.01);
Abstract

A substrate processing deviceincludes a cleaning liquid supply unitsupplying a cleaning liquid to a surface of a substrate W, a solvent supply unitsupplying a volatile solvent to the surface of the substrate W supplied with the cleaning liquid to replace the cleaning liquid on the surface of the substrate W with the volatile solvent, a heating unitheating the substrate W supplied with the volatile solvent, and a drying unitdrying the surface of the substrate W by removing a droplet of the volatile solvent produced on the surface of the substrate W by a heating operation of the heating unit, and the heating unitand the drying unitare arranged in a course of transportation of the substrate W transported from the solvent supply unit


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