The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2017

Filed:

May. 23, 2012
Applicants:

John H. Zhang, Fishkill, NY (US);

Laertis Economikos, Wappingers Falls, NY (US);

Wei-tsu Tseng, Hopewell Junction, NY (US);

Adam Ticknor, Poughkeepsie, NY (US);

Inventors:

John H. Zhang, Fishkill, NY (US);

Laertis Economikos, Wappingers Falls, NY (US);

Wei-Tsu Tseng, Hopewell Junction, NY (US);

Adam Ticknor, Poughkeepsie, NY (US);

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); B01D 24/00 (2006.01); B01D 53/82 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); B01D 24/008 (2013.01); H01L 21/67051 (2013.01); B01D 53/82 (2013.01); B01D 2201/287 (2013.01); B01D 2253/206 (2013.01); B01D 2258/0216 (2013.01);
Abstract

The present disclosure is directed to fluid filtering systems and methods for use during semiconductor processing. One or more embodiments are directed to fluid filtering systems and methods for filtering ions and particles from a fluid as the fluid is being provided to a semiconductor wafer processing tool, such as to a semiconductor wafer cleaning tool.


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