The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Aug. 21, 2012
Applicants:
Vladimir Dmitriev, Moran, IL;
Uri Stern, Tivon, IL;
Inventors:
Vladimir Dmitriev, Moran, IL;
Uri Stern, Tivon, IL;
Assignee:
Carl Zeiss SMS Ltd., Karmiel, IL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03F 7/20 (2006.01); G03F 1/72 (2012.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 1/60 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 1/72 (2013.01); G03F 7/70025 (2013.01); G03F 1/60 (2013.01); G03F 7/0002 (2013.01);
Abstract
The invention relates to a method for locally deforming an optical element for photolithography in accordance with a predefined deformation form comprising: (a) generating at least one laser pulse having at least one laser beam parameter; and (b) directing the at least one laser pulse onto the optical element, wherein the at least one laser beam parameter of the laser pulse is selected to yield the predefined deformation form.