The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 28, 2017

Filed:

Jun. 10, 2015
Applicant:

Jordan Valley Semiconductors Ltd., Migdal HaEmek, IL;

Inventors:

Isaac Mazor, Haifa, IL;

Alex Krokhmal, Haifa, IL;

Alex Dikopoltsev, Haifa, IL;

Matthew Wormington, Littleton, CO (US);

Assignee:

BRUKER JV ISRAEL LTD., Migdal Haemek, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/201 (2006.01);
U.S. Cl.
CPC ...
G01N 23/201 (2013.01); G01N 2223/6116 (2013.01);
Abstract

Apparatus, including a sample-support that retains a sample in a plane having an axis, the plane defining first and second regions separated by the plane. A source-mount in the first region rotates about the axis, and an X-ray source on the source-mount directs first and second incident beams of X-rays to impinge on the sample at first and second angles along beam axes that are orthogonal to the axis. A detector-mount in the second region moves in a plane orthogonal to the axis and an X-ray detector on the detector-mount receives first and second diffracted beams of X-rays transmitted through the sample in response to the first and second incident beams, and outputs first and second signals, respectively, in response to the received first and second diffracted beams. A processor analyzes the first and the second signals so as to determine a profile of a surface of the sample.


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