Nonvolatile semiconductor memory device and method of manufacturing the same

Abstract

The memory cell array includes a memory string and a select transistor. The memory string includes plural memory cells connected in series, the memory string being formed to extend in a first direction as a lengthwise direction. The select transistor is connected to one end of the memory string. In the wiring section, a conductive layer and an interlayer insulating layer are laminated alternately to form plural layers. The conductive layer functions as a gate electrode of the memory cells and the select transistor. One select transistor includes plural conductive layers, and the plural conductive layers are connected in common by a common first contact. The plurality of the conductive layers and the first contact include a barrier metal formed in a periphery thereof. The plurality of the conductive layers and the first contact are in contact without the barrier metal therebetween at a boundary thereof.