The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2017
Filed:
Nov. 11, 2015
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Marco Hugo Petrus Moers, Best, NL;
Albert Visscher, Veldhoven, NL;
Assignee:
FEI COMPANY, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/265 (2013.01);
Abstract
A method of mitigating the effects of environmental pressure variation while using a charged particle microscope is described. The charged particle microscope equipped with a barometric pressure sensor and an automatic controller configured to use the signal from the barometric sensor as an input to a control procedure to compensate for a relative positional error between the charged particle beam and the specimen holder.
Quick Actions:
Moers, Marco Hugo Petrus. (2017). Charged particle microscope with barometric pressure correction (U.S. Patent No. 9601310). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9601310
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile